店鋪： 韻讀圖書專營店
齣版社： 哈爾濱工業大學齣版社
ISBN：9787560342801
商品編碼：29757085723
包裝：平裝
齣版時間：2014-01-01
具體描述
| 圖書基本信息 | |||
| 圖書名稱 | 矽加工中的錶徵 | 作者 | (美)布倫協爾 等 |
| 定價 | 88.00元 | 齣版社 | 哈爾濱工業大學齣版社 |
| ISBN | 9787560342801 | 齣版日期 | 2014-01-01 |
| 字數 | 頁碼 | ||
| 版次 | 1 | 裝幀 | 平裝 |
| 開本 | 16開 | 商品重量 | 0.4Kg |
| 內容簡介 | |
| 《矽加工中的錶徵》是材料錶徵原版係列叢書之一。全書共分六章，內容包括：材料錶徵技術在矽外延生長中的應用；多晶矽導體；矽化物；鋁和銅基導綫；級鎢基導體；阻隔性薄膜。本書適閤作為相關領域的教學、研究、技術人員以及研究生和高年級本科生的參考書。 |
| 作者簡介 | |
| 目錄 | |
| Preface to the Reissue of the Materials Characterization Series Preface to Series Preface to the Reissue of Characterization in Silicon Processing Preface Contributors APPLICATION OF MATERIALS CHARACTERIZATION TECHNIQUES TO SILICON EPITAXIAL GROWTH 1.1 Introduction 1.2 Silicon Epitaxial Growth 1.3 Film and Process Characterization 1.4 Selective Growth 1.5 Si1_xGex Epitaxial Growth 1.6 Si1_ xGex Material Characterization 1.7 Summary POLYSILICON CONDUCTORS 2.1 Introduction 2.2 Deposition 2.3 Doping 2.4 Patterning 2.5 Subsequent Processing SILICIDES 3.1 Introduction 3.2 Formation of Silicides 3.3 The Silicide-Silicon Interface 3.4 Oxidation of Silicides 3.5 Dopant Redistribution During Silicide Formation 3.6 Stress in Silicides 3.7 Stability of Silicides 3.8 Summary ALUMINUM- AND COPPER-BASED CONDUCTORS 4.1 Introduction 4.2 Film Deposition 4.3 Film Growth 4.4 Encapsulation 4.5 Reliability Concerns TUNGSTEN-BASED CONDUCTORS 5.1 Applications for ULSI Processing 5.2 Deposition Principles 5.3 Blanket Tungsten Deposition 5.4 Selective Tungsten Deposition BARRIER FILMS 6.1 Introduction 6.2 Characteristics of Barrier Films 6.3 Types of Barrier Films 6.4 Processing Barrier Films 6.5 Examples of Barrier Films 6.6 Summary APPENDIX: TECHNIQUE SUMMARIES 1 Auger Electron Spectroscopy (AES) 2 Ballistic Electron Emission Microscopy (BEEM) 3 Capacitance-Voltage (C-V) Measurements 4 Deep Level Transient Spectroscopy (DLTS) 5 Dynamic Secondary Ion Mass Spectrometry (Dynamic SIMS) 6 Electron Beam Induced Current (EBIC) Microscopy 7 Energy-Dispersive X-Ray Spectroscopy (EDS) 8 Focused Ion Beams (FIBs) 9 Fourier Transform Infrared Spectroscopy (FTIR) 10 Hall Effect Resistivity Measurements 11 Inductively Coupled Plasma Mass Spectrometry (ICPMS) 12 Light Microscopy 13 Low-Energy Electron Diffraction (LEED) 14 Neutron Activation Analysis (NAA) 15 Optical Scatterometry 16 Photoluminescence (PL) 17 Raman Spectroscopy 18 Reflection High-Energy Electron Diffraction (RHEED) 19 Rutherford Backscattering Spectrometry (RBS) 20 Scanning Electron Microscopy (SEM) 21 Scanning Transmission Electron Microscopy (STEM) 22 Scanning Tunneling Microscopy and Scanning Force Microscopy (STM and SFM) 23 Sheet Resistance and the Four Point Probe 24 Spreading Resistance Analysis (SRA) 25 Static Secondary Ion Mass Spectrometry (Static SIMS) 26 Surface Roughness: Measurement, Formation by Sputtering, Impact on Depth Profiling 27 Total Reflection X-Ray Fluorescence Analysis (TXRF) 28 Transmission Electron Microscopy (TEM) 29 Variable-Angle Spectroscopic Ellipsometry (VASE) 30 X-Ray Diffraction (XRD) 31 X-Ray Fluorescence (XRF) 32 X-Ray Photoelectron Spectroscopy (XPS) Index |
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